Category：Polishing fluid
Product Parameters:
| Item | HPHE/SSPS-SH-2034 |
| Silicon Dioxide (SiO₂) % | 38-42 |
Specific Gravity (20℃, g/cm³) | 1.265-1.3 |
| PH Value (20℃) | 10.0-12.5 |
| Viscosity (20℃, mm²/s) | ≤5 |
| Average Particle Size (nm) | 120-140 |
| Modified Additive | Yes |
Stable Period (months) | Six Months |
Product Description:
Product Appearance: Milky white.
Product Application: It is suitable for the polishing of semiconductor materials such as silicon and gallium arsenide. It has a high purity and a fast removal rate.
Precautions:
1. Packaged in 25L, 200L or 1000L polyethylene plastic drums. Transport and store it in an environment with a temperature ranging from 0°C to 40°C.
2. Avoid contact with eyes and skin during use. In case of accidental contact, rinse thoroughly with running water.
