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Conventional silica sol
Customized high-purity silica sol
Silica sol with large particle size and high purity
Polishing fluid
Data download
HPHE/GAPS-SH-1834
Product Application: It is suitable for the polishing of gallium arsenide. It has a fast removal rate, a good surface effect, the particle size of the abrasive can be controlled, and it is easy to clean.
HPHE/SPS-SH-1804
Product Application: It is suitable for the polishing process of various ceramic materials. It has a fast removal rate, excellent surface effect, the abrasive particle size is controllable, and it is easy to clean.
HPHE/SSPS-SH-2034
Product Application: It is suitable for the polishing of semiconductor materials such as silicon and gallium arsenide. It features high purity and a fast removal rate.
HPHE/AAPS-IE-1912
Product Application: It is suitable for the chemical mechanical polishing of 3C metal materials, featuring excellent polishing effects, preventing the corrosion of workpieces, and being easy to clean.
HPHE/SPS-SH-1813
Product Application: It is suitable for the chemical mechanical polishing of sapphire and optical glass materials, featuring a high removal rate and a long service life.
